Oral presentation

[19p-S224-1~17] 7.3 Micro/Nano patterning and fabrication

Sat. Mar 19, 2016 1:30 PM - 6:00 PM S224 (S2)

Makoto Okada(Univ. of Hyogo), Atsushi Yokoo(NTT)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:30 PM - 1:45 PM

[19p-S224-1] Area-selective organic-inorganic hybridization of PS-block-PMMA
~Comparison between semi-static mode and continuous flow mode~

〇Nobuya Hiroshiba¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

1:45 PM - 2:00 PM

[19p-S224-2] Ordering analysis of randomly-aligned in-plane cylindrical domains of polystyrene-b-polydimethylsiloxane by thermal annealing method

〇Toru Yamaguchi¹, Akira Fujiwara¹ (1.NTT BRL)

2:00 PM - 2:15 PM

[19p-S224-3] Directed self-assembly of polystyrene-block-poly(methyl methacrylate) in sub-100 nm-wide resin trenches fabricated using UV-nanoimprinting

〇(B)Tetsuhisa Kanahara¹, Ryo Okubo¹, Nobuya Hiroshiba¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

2:15 PM - 2:30 PM

△ [19p-S224-4] Fabrication of array patterns of Au nanoparticles onto atomically stepped polymer sheets by thermal-nanoimprint batch transfer process

〇Kodai Shimada¹, Geng Tan¹, Yasuhisa Nozawa¹, Tatsuhiro Urakami², Koji Koyama³, Masahiro Mita⁴, Satoru Kaneko^5,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech, 2.Mitsui Chemicals, Inc., 3.Namiki Precision Jewel Co., Ltd., 4.KYODO INTERNATIONAL, INC., 5.Kanagawa Ind. Tech. Cent.)

2:30 PM - 2:45 PM

[19p-S224-5] Direct Surface Patterning on A Protein by Thermal Imprinting

〇Harutaka Mekaru¹ (1.AIST)

2:45 PM - 3:00 PM

[19p-S224-6] Molecular orientation observation of negative-tone and positive-tone liquid crystalline polymer pattern fabricated by nanoimprint-graphoepitaxy

〇Makoto Okada¹, Yusuke Taniguchi², Yuichi Haruyama¹, Hiroshi Ono³, Nobuhiro Kawatsuki², Shinji Matsui¹ (1.LASTI, Univ. of Hyogo, 2.Graduate School of Engineering, Univ. of Hyogo, 3.Nagaoka Univ. of Technology)

3:00 PM - 3:15 PM

[19p-S224-7] Molecular orientation evaluation of liquid crystalline polymer pattern fabricated by double nanoimprint-graphoepitaxy

3:15 PM - 3:30 PM

[19p-S224-8] Preparation of Super-Hydrophobic Surfaces by Nanoimprinting Using Anodic Porous Alumina

〇Takashi Yanagishita¹, Kaito Murakoshi¹, Toshiaki Kondo¹, Hideki Masuda¹ (1.Tokyo Metropolitan Univ.)

3:45 PM - 4:00 PM

[19p-S224-9] Fabrication of 3D structure with fine patterns by novel reversal imprinting

〇(B)Yuki Sawada¹, Kazuo Fujii¹, Hiroaki Kawata¹, Masaaki Yasuda¹, Yoshihiko Hirai¹ (1.Osaka Pref. univ.)

4:00 PM - 4:15 PM

[19p-S224-10] Study on stress relaxation in thermal nanoimprint lithography

〇(B)Tatsuya Iida¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yosihiko Hirai¹ (1.Osaka Pre Univ.)

4:15 PM - 4:30 PM

[19p-S224-11] Dependence of film thickness on surface elasticity observed for
sub-100 nm-thick UV-cured resin films by atomic force microscopy

〇(M1)HARUNA YANO¹, SHOICHI KUBO², MASARU NAKAGAWA¹, XIAOBIN RIANG³, SO FUJINAMI⁴, KEN NAKAJIMA³ (1.Tohoku Univ., 2.NIMS, 3.Tokyo Tech., 4.RIKEN)

4:30 PM - 4:45 PM

[19p-S224-12] Evaluation of PDMS antisticking layer formed by using PDMS-disilanol

〇Makoto Okada¹, Shinji Matsui¹ (1.LASTI, Univ. of Hyogo)

4:45 PM - 5:00 PM

[19p-S224-13] Dependence of de-molding force and defects rate on template stiffness

〇Naoto Nakamura¹, Chalvin Florian², Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref Univ., 2.ENSEA)

5:00 PM - 5:15 PM

▲ [19p-S224-14] Induced stress during peeling release with various template stiffness in nanoimprint lithography

〇(M2)Florian Chalvin^1,2, Takamitsu Tochino¹, Naoto Nakamura¹, Masaaki Yasuda¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ., 2.ENSEA)

5:15 PM - 5:30 PM

[19p-S224-15] Formation of a screen printing mask by femtosecond laser drilling on polyimide films and effect of hole structure on the volume of dispensed resin droplets

Akira Tanabe¹, Koki Omachi¹, 〇Takahiro Nakamura¹, Shunichi Sato¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ.)

5:30 PM - 5:45 PM

[19p-S224-16] Fabrication of through-hole membranes by laser drilling for discharging UV-curable liquids in UV nanoimprint lithography

〇Kento Seki¹, Kazuro Nagase², Nobuya Hiroshiba¹, Masaru Nakagawa¹, Takahiro Nakamura¹ (1.IMRAM Tohoku Univ., 2.Mino Group Corp.)

5:45 PM - 6:00 PM

[19p-S224-17] Detachable Mold Fixing Methods in Ultrasonic Nanoimprinting

〇Harutaka Mekaru¹, Takayuki Yano² (1.AIST, 2.IMS)

Oral presentation

[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

Sun. Mar 20, 2016 9:30 AM - 12:00 PM S224 (S2)

Toshiyuki Horiuchi(Tokyo Denki Univ.), Satoshi Tanaka(EIDEC)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:30 AM - 9:45 AM

△ [20a-S224-1] Development of a transmittance measurement method for EUV resist using a photodiode

〇Daiki Mamezaki¹, Masanori Watanabe¹, Haruki Iguchi¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.University of Hyogo)

9:45 AM - 10:00 AM

[20a-S224-2] A Molecular Simulation of EUV Lithography

〇Akinori Iwai¹, Hiroaki Kawata¹, Yoshihiko Hirai¹, Masaaki Yasuda¹ (1.Osaka Pref. Univ.)

10:00 AM - 10:15 AM

[20a-S224-3] Computational nano OPC Design For Manufacturing for Fin-type SRAM

〇Kazuya Kadota¹ (1.Nanosciencelab)

10:15 AM - 10:30 AM

[20a-S224-4] The distribution of polarization inside beam of excimer laser for semiconductor lithography tools

〇Daisuke Tei¹, takahito kumazaki¹, hiroaki tsushima¹, akihiko kurosu¹, takeshi ohta¹, takashi matsunaga¹, hakaru mizoguchi¹ (1.Gigaphoton Inc.)

10:45 AM - 11:00 AM

[20a-S224-5] Improvement of Pattern Width Uniformity by Controlling Each Cell Transmittance in Liquid-Crystal-Display Matrix Exposure

〇Toshiyuki Horiuchi¹, Shota Haneishi¹, Yumika Yoshida¹, Hiroshi Kobayashi¹ (1.Tokyo Denki Univ.)

11:00 AM - 11:15 AM

[20a-S224-6] Computational study on novel photolithography on deep stepped substrate by Built-in lens mask lithography

〇Toshiki Tanaka¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshikhiko Hirai¹ (1.Osaka Pref. Univ.)

11:15 AM - 11:30 AM

△ [20a-S224-7] Dependence of exposure characteristics of polymer type electron beam resists on molecular weight

〇Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Ryoichi Hoshino², Atsushi Kawata² (1.Yamaguchi Univ., 2.LLC Gluon Lab)

11:30 AM - 11:45 AM

△ [20a-S224-8] Exposure Characteristics of New Modacrylic Electron Beam Polymer Resist (Ⅱ)

〇Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Masashi Kunitake², Ryoichi Hoshino³, Atushi Kawata³ (1.Yamaguchi Univ., 2.Kumamoto Univ., 3.LLC Gluon Lab.)

11:45 AM - 12:00 PM

[20a-S224-9] Formation of Au nanoparticles on micro/nano pattern base on poly(vinylpyrrolidone)

〇Satoshi Tsukuda¹, Kazumasa Okamoto², Hiroki Yamamoto³, Takahiro Kozawa³ (1.IMRAM Tohoku Univ., 2.Hokkaido Univ., 3.ISIR Osaka Univ.)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication