The Japan Society of Applied Physics

338 results (111 - 120)

[B-6-3] High-Resolution Photoelectron Spectroscopy of Interfacial Nitrogen in Ultrathin Si Oxynitride Films

M. Oshima, J. H. Oh, K. Ono, H. Kiwata, K. Nakamura, M. Niwa, K. Usuda, N. Hirashita, H. W. Yeom, Y. D. Chung, H. J. Shin (1.Department of Applied Chemistry, The University of Tokyo, 2.Semiconductor Technology Academic Research Center, 3.ASSRC, Yonsei University, 4.Pohang Accelerator Laboratory, Pohang University of Science and Technology)

2001 International Conference on Solid State Devices and Materials |PDF Download

[B-6-5] Monolayer Nitridation of Si(001) Surfaces

Yukinori Morita, Takao Ishida, Hiroshi Tokumoto (1.Joint Research Center for Atom Technology (JRCAT), 2.National Institute of Advanced Industrial Science and Technology (AIST))

2001 International Conference on Solid State Devices and Materials |PDF Download

[C-3-1] Future SOI Technology and Devices

Jean-Pierre Colinge, Jong-Tae Park (1.Department of Electrical and Computer Engineering, One Shields Avenue, University of California, 2.Department of Electronics Engineering, University of Inchon)

2001 International Conference on Solid State Devices and Materials |PDF Download

338 results (111 - 120)