[H-2-1] III-V Nanowires grown by MOCVD for Optoelectronics Applications

H. H. Tan¹, Q. Gao¹, H. J. Joyce¹, J. H. Kang¹, S. Paiman¹, J. Wong-Leung¹, J. Zou¹, M. Paladugu¹, Y. Guo¹, H. Wang¹, X. Zhang¹, C. Jagadish¹ (1.Australian National Univ.)

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-2] Growth and Electronic Structure of Epitaxial Graphene on Silicon Carbide

A. Bostwick¹, E. Rotenberg¹, J. McChesney^1,2, T. Ohta^1,2, T. Seyller³, K. Horn² (1.ALS. Lawrence Berkeley Lab.(USA), 2.Fritz Haber Inst.(Germany), 3.Univ. Erlangen(Germany))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-3] Thin Graphitic Structure Formation on Various Substrates by Gas-Source Molecular Beam Epitaxy using Cracked-Ethanol

F. Maeda¹, H. Hibino¹ (1.NTT Basic Res. Labs.)

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-4] Effect of Carrier Gas (Ar and He) on the Crystallographic Quality of Multi-layer Graphene Grown on Si by Photoemission-assisted Plasma CVD

H. Sumi¹, S. Ogawa^1,2, A. Saikubo^2,3, E. Ikenaga^2,3, M. Nihei^2,4, Y. Takakuwa^1,2 (1.Tohoku Univ.(Japan), 2.CREST-JST(Japan), 3.JASRI/SPring-8(Japan), 4.Fujitsu Ltd.(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-5] Electronic Structure of Carbon Nanowalls using Resonant Soft-X-Ray Emission Spectroscopy

W. Takeuchi¹, M. Hiramatsu², Y. Tokuda³, H. Kano⁴, T. Kinoshita⁵, Y. Kato⁵, T. Muro⁵, S. Kimura⁵, M. Hori¹ (1.Nagoya Univ.(Japan), 2.Aichi Inst. Of Tech.(Japan), 3.Meijo Univ.(Japan), 4.NU Eco-Engi. Co. ,Ltd.(Japan), 5.JASRI/Spring-8(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-6L] Epitaxy of Graphene on Si substrates toward Three-Dimensional Graphene Devices

H. Fukidome¹, Y. Miyamoto¹, H. Handa^1,2, R. Takahashi¹, K. Imaizumi¹, M. Suemitsu^1,2 (1.Tohoku Univ.(Japan), 2.CREST-JST(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-2-7L] Micro/nanospheres from polysilsequioxane containing UVB-absorbing group

P. Kidsaneepoiboon¹, S. P. Wanichwecharungruang¹ (1.Chulalongkorn Univ.)

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-3-1] High throughput combinatorial materials Exploration for advanced magneto-electronics

T. Fukumura^1,2 (1.Tohoku Univ.(Japan), 2.PRESTO-JST(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-3-2] Control of Crystal-growth of VO₂ Films Fabricated by Excimer Laser Assisted Metal Organic Deposition

M. Nishikawa¹, T. Nakajima², T. Kumagai², T. Okutani¹, T. Tsuchiya² (1.Yokohama National Univ.(Japan), 2.AIST(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

[H-3-3] Prediction of Crystallization Temperature for HfO₂ Thin Film in High Temperature Annealing Process by Reaction Time Accelerating Molecular Dynamics

K. Nishitani^1,2, H. Yabuhara¹, A. Endou², A. Suzuki², H. Tsuboi², N. Hatakeyama², H. Takaba², M. Kubo², A. Miyamoto² (1.Toshiba Corp.(Japan), 2.Tohoku Univ.(Japan))

2009 International Conference on Solid State Devices and Materials |PDF Download

707 results (271 - 280)

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