The Japan Society of Applied Physics

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[A-2-1] The impacts of ArF Excimer Immersion Lithography on Integrated Silicon Photonics Tech.

H. Takahasi1,2, M. Toyama1,3, M. Seki1,3, D. Shimura1,2, K. Koshino1,3, N. Yokoyama1,3, M. Ohtsuka1,3, A. Sugiyama1,3, E. Ishitsuka1,3, T. Sano1,3, T. Horikawa1,3 (1.Inst. for Photonics-Electronics Convergence System Tech.(PECST), 2.Photonics Electronics Tech. Research Association(PETRA), 3.National Inst. of Advanced Industrial Science and Tech.(AIST) , Japan)

2012 International Conference on Solid State Devices and Materials |PDF Download

665 results (1 - 10)