The Japan Society of Applied Physics

665 results (101 - 110)

[D-1-2] Effective Work Function Engineering for Aggressively Scaled Planar and FinFET-based Devices with High-k Last Replacement Metal Gate Tech.

A. Veloso1, S. A. Chew1, Y. Higuchi2, L. A. Ragnarsson1, E. Simoen1, T. Schram1, T. Witters1, A. Van Ammel1, H. Dekkers1, H. Tielens1, K. Devriendt1, N. Heylen1, F. Sebaai1, S. Brus1, P. Favia1, J. Geypen1, H. Bender1, A. Phatak3, M. S. Chen4, X. Lu4, S. Ganguli4, Y. Lei4, W. Tang4, X. Fu4, S. Gandikota4, A. Noori4, A. Brand4, N. Yoshida4, A. Thean1, N. Horiguchi1 (1.IMEC , Belgium, 2.Panasonic , Japan, 3.Applied Materials Belgium NV , Belgium, 4.Applied Materials Inc. , USA)

2012 International Conference on Solid State Devices and Materials |PDF Download

[D-1-4] RMG Tech. Integration in FinFET Devices

G. Boccardi1, R. Ritzenthaler1, M. Togo1, T. Chiarella1, M. S. Kim1, S. Yuichiro1, A. Veloso1, S. A. Chew1, E. Vecchio1, S. Locorotondo1, K. Devriendt1, P. Ong1, S. Brus1, N. Horiguchi1, A. Thean1 (1.IMEC , Belgium)

2012 International Conference on Solid State Devices and Materials |PDF Download

665 results (101 - 110)