Oral presentation

[12a-N203-1~10] 6.4 Thin films and New materials

Sun. Sep 12, 2021 9:00 AM - 11:30 AM N203 (Oral)

Yuji Muraoka(Okayama Univ.), Hiroshi Murotani(Tokai Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

[12a-N203-1] Optimization of lowermost layer material for low-resistivity Ag-based multilayer structure in low-emissivity glass

〇(D)Koji Mizukoshi^1,2, Takafumi Yamamura³, Yasuhiro Tomioka³, Midori Kawamura¹ (1.Kitami Inst. of Tech., 2.YKK AP, 3.YKK)

9:15 AM - 9:30 AM

[12a-N203-2] Influence of sputtering gas species on resistivity of Al and Pt thin films

〇Fumito Hayasaka¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹ (1.Kitami Inst. of Tech.)

9:30 AM - 9:45 AM

[12a-N203-3] Properties of Ti and TiN thin films sputtered in different gas species

〇Kazuhisa Suzuki¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹ (1.Kitami Inst. of Tech.)

9:45 AM - 10:00 AM

[12a-N203-4] Metal–Organic Molecular Beam Epitaxy of Titanium Nitride

〇Isao Ohkubo¹, Takashi Aizawa¹, Mikk Lippmaa², Takao Mori¹ (1.NIMS, 2.ISSP, U. of Tokyo)

10:00 AM - 10:15 AM

[12a-N203-5] Mobility improvement of B-doped In₂O₃ transparent conductive film
with a small amount of impurity

〇(M1)Shun Mori¹, Yukiya Ichinoseki¹, Kotaro Watanabe¹, Kaito Oe¹, Hiroki Nagai¹, Tomohiro Yamaguchi¹, Takeyoshi Onuma¹, Tohru Honda¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

10:15 AM - 10:30 AM

[12a-N203-6] Dopant concentration dependence of surface roughness and electrical conductivity on CaF₂-doped In₂O₃ transparent conductive film

〇(M2)Kaito Oe¹, Shun Mori¹, Kotaro Watanabe¹, Hiroki Nagai¹, Tomohiro Yamaguchi¹, Takeyoshi Onuma¹, Tohru Honda¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

10:30 AM - 10:45 AM

[12a-N203-7] Growth and electronic properties of ultrathin Bi₂Te₃ films on CaF₂

〇Shinichiro Hatta¹, Shinpei Higaki¹, Hiroshi Okuyama¹, Tetsuya Aruga¹ (1.Kyoto Univ.)

10:45 AM - 11:00 AM

[12a-N203-8] Electrochemical impedance spectroscopy investigation on the effect of crystal orientation on the electrochemical properties of vetically aligned MoS₂

〇Kazuki Takahashi¹, Koki Sato¹, Masato Matsushima¹, Joonam Kim^1,2, Mutsumi Sugiyama^1,2 (1.Tokyo Univ. of Sci., 2.RIST)

11:00 AM - 11:15 AM

[12a-N203-9] Investigation of crystallization and sulfurization conditions of precursors for the deposition of highly oriented vertically aligend MoS₂ thin films

〇Masato Matsushima¹, Kazuki Takahashi¹, Joonam Kim^1,2, Mutsumi Sugiyama^1,2 (1.Tokyo Univ. Sci., 2.RIST)

11:15 AM - 11:30 AM

[12a-N203-10] Soft Probe for Electric Contact to Fragile Specimens

〇Michiko Yoshitake¹ (1.NIMS)

Oral presentation

[12p-N203-1~12] 6.4 Thin films and New materials

Sun. Sep 12, 2021 1:30 PM - 4:45 PM N203 (Oral)

Katsuhisa Tanaka(Kyoto Univ.), Yoshinobu Nakamura(Univ. of Tokyo), Osamu Nakatsuka(Nagoya Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

[12p-N203-1] [INVITED] Effect of Nitrogen Impurity Atoms at Fe/MgO Interface on Magnetic Anisotropy and TMR

〇Yutaro Ogawa¹, Masaaki Araidai^1,2, Tetsuo Endoh^3,4, Kenji Shiraishi^1,2,3 (1.Nagoya Univ., 2.IMaSS, Nagoya Univ, 3.CIES, Tohoku Univ., 4.RIEC, Tohoku Univ.)

1:45 PM - 2:00 PM

[12p-N203-2] Textured growth of Co-Fe-Ga alloy films via topotactic transformation from highly oriented precursor

〇Yuta Ohno¹, Keisuke Yamada¹, Mutsuhiro Shima¹ (1.Gifu Univ.)

2:00 PM - 2:15 PM

[12p-N203-3] Investigation of pre-annealing conditions for Bi-substituted rare-earth iron garnet thin films by ELAMOD

〇(M1)Takumi Fujita¹, Haruka Aiba¹, Masami Nishikawa¹, Masami Kawahara², Tomohiko Nakajima³, Tetsuo Tutiya³, Takayuki Ishibashi¹ (1.Nagaoka Univ. of Teck., 2.Kojundo Chem. Lab., 3.AIST)

2:15 PM - 2:30 PM

[12p-N203-4] Control of nano-checkerboard structure of ZnMnGaO₄ thin films by post annealing

〇(M2)Kazuki Morishita¹, Tomoya Horide¹, Yoichi Horibe¹, Manabu Ishimaru¹, Kaname Matsumoto¹ (1.Kyushu Inst Tech.)

2:30 PM - 2:45 PM

[12p-N203-5] Spinodal decomposition in rutile-type TiO₂-RuO₂ films

〇Yuji Muraoka¹, Takumi Kawahara², Takanori Wakita¹, Takayoshi Yokoya¹, Yoshito Takemoto² (1.Okayama Univ. RIIS, 2.Okayama Univ.)

2:45 PM - 3:00 PM

[12p-N203-6] Structural analysis of metastable phase perovskite-type calcium tantalate thin film

〇Takahiko Kawaguchi¹, Mayuko Sugita¹, Naonori Sakamoto¹, Hisao Suzuki¹, Naoki Wakiya¹ (1.Shizuoka Univ.)

3:00 PM - 3:15 PM

[12p-N203-7] Protection of epitaxial Pb(Zr, Ti)O₃ thin films from transfer process using SrRuO₃ thin films

〇Tomofumi Mizuyama¹, Norimitsu Hirosaki², Hiroaki Nishikawa³ (1.Grad. Sch., Kindai Univ., 2.Taiyo Industrial Co., LTD., 3.Kindai Univ.)

3:30 PM - 3:45 PM

[12p-N203-8] ITO transparent conductive film formed by microwave heating technique under various atmospheres

〇Kyosuke Toda¹, Naoma Konishi¹, Kanta Naito¹, Masayuki Okuya¹ (1.Shizuoka Univ.)

3:45 PM - 4:00 PM

[12p-N203-9] Porous TiO₂ layers formed with irradiating microwave magnetic field and their application to dye-sensitized solar cells

〇Naoma Konishi¹, Kyosuke Toda¹, Kanta Naito¹, Masayuki Okuya¹ (1.Shizuoka Univ.)

4:00 PM - 4:15 PM

[12p-N203-10] Porous TiO₂ films formed with atmospheric non-equilibrium plasma under magnetic field and their application to dye-sensitized solar cells

〇Yuki Nagao¹, Shinji Mayumi¹, Minato Sawamura¹, Masayuki Okuya¹ (1.Shizuoka Univ.)

4:15 PM - 4:30 PM

[12p-N203-11] Color Change Associated with Atmospheric Chemical Vapor Deposition Technique-Al₂O₃ Films in Annealing

〇Hidemichi Honda¹, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech.)

4:30 PM - 4:45 PM

[12p-N203-12] Thermal Conductivity of Magnesium Oxide Insulating Films Synthesized by Chelate Flame Deposition

〇Ruohui Xu¹, Keiji Komatsu¹, Atsushi Nakamura^1,2, Osamu Ito^1,2, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest)

Oral presentation

[13a-N203-1~7] 6.4 Thin films and New materials

Mon. Sep 13, 2021 9:30 AM - 11:15 AM N203 (Oral)

Takayuki Ishibashi(Nagaoka Univ. of Tech.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:30 AM - 9:45 AM

[13a-N203-1] A study on conduction properties of α-YbH₂_±δ films

〇(M2)Satoru Kitsunai¹, Tosihiro Yoshizumi¹, Osamu Nakamura², Shigehiko Hasegawa³, Masamichi Sakai¹ (1.Saitama Univ., 2.Okayama Univ. of Sci, 3.Osaka Univ.)

9:45 AM - 10:00 AM

▼ [13a-N203-2] Selective fabrication of Ca₂NH and CaNH epitaxial thin films using reactive magnetron sputtering

〇(D)Seoungmin Chon¹, Ryota Shimizu^1,2, Yuki Sugisawa³, Shigeru Kobayashi¹, Kazunori Nishio¹, Markus Wilde⁴, Daiichiro Sekiba³, Katsuyuki Fukutani^4,5, Taro Hitosugi¹ (1.Tokyo Tech, 2.JST-PRESTO, 3.Univ. of Tsukuba, 4.Univ. of Tokyo, 5.JAEA)

10:00 AM - 10:15 AM

△ [13a-N203-3] Epitaxial thin-film growth and optical property characterization of a layered compound BiI₃

〇(M1)Takahiro Yasuami¹, Masao Nakamura², Soutarou Inagaki¹, Shingo Toyoda², Naoki Ogawa^1,2, Yoshinori Tokura^1,2,3, Masashi Kawasaki^1,2 (1.Univ. of Tokyo, 2.RIKEN-CEMS, 3.Tokyo College)

10:15 AM - 10:30 AM

△ [13a-N203-4] Low-Temperature Growth of Non-Degenerate Wurtzite-Type Mg_xZn_1-xSnN₂Alloy Films

〇(M2)Mari Mizutani¹, Shunichiro Yata¹, Kenta Matsuura¹, Fumio Kawamura², Masataka Imura³, Hidenobu Murata³, Junjun Jia⁴, Naoomi Yamada¹ (1.Chubu Univ., 2.NIMS., 3.Osaka Pref.Univ., 4.Waseda Univ.)

10:30 AM - 10:45 AM

△ [13a-N203-5] Conduction-Band Effective Mass in Wurtzite-Type MgSnN₂

〇(M1)Shunichiro Yata¹, Mari Mizutani¹, Kaede Makiuchi¹, Fumio Kawamura², Masataka Imura², Hidenobu Murata³, Junjun Jia⁴, Naoomi Yamada¹ (1.Chubu Univ., 2.NIMS, 3.Osaka Pref. Univ., 4.Waseda Univ.)

10:45 AM - 11:00 AM

▼ [13a-N203-6] A study of Ar/N₂-sputtering gas pressure on electrical characteristics of LaB_xN_y insulator formed by RF sputtering

〇(D)EUNKI HONG¹, Shun-ichiro Ohmi¹ (1.Tokyo Inst. of Technology)

11:00 AM - 11:15 AM

△ [13a-N203-7] Epitaxial growth of IMO thin film on YSZ(111) by mist CVD method

〇(M1)Takayuki Ishino¹, Shimazoe Kazuki¹, Nishinaka Hiroyuki¹, Yoshimoto Masahiro¹ (1.Kyoto Inst. Tech.)

Oral presentation

[13p-N203-1~10] 6.4 Thin films and New materials

Mon. Sep 13, 2021 1:30 PM - 4:00 PM N203 (Oral)

Tetsuo Tsuchiya(AIST), Hiroaki Nishikawa(Kindai Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

[13p-N203-1] Electronic structure measurements of Pt/AlFeO₃/Nb:SrTiO₃ hetero-film for resistance switching material by high resolution X-ray absorption spectroscopy

〇Yuri Endo¹, Kato Seiya¹, Nakajima Nobuo¹, Badari Narayana Rao², Yasui Shintaro³, Osawa Hitoshi⁴, Kawamura Naomi⁴ (1.Hiroshima Univ., 2.Chiba Univ., 3.Tokyo Inst. Tech., 4.JASRI)

1:45 PM - 2:00 PM

△ [13p-N203-2] PLD synthesis and characterization of aliovalent-doped layered La-Ni-O system epitaxial films

〇(M2)Shohei Hisatomi¹, Yuki Goto¹, Tomoaki Oga¹, Satoru Kaneko^2,1, Mamoru Yoshimoto¹, Akifumi Matsuda¹ (1.Tokyo Tech, 2.KISTEC)

2:00 PM - 2:15 PM

△ [13p-N203-3] Preliminary synthesis of LiNi_0.67Mn_0.33O₂ epitaxial thin films
for designing compositionally graded thin film LiNi_xMn_yCo_zO₂

〇(M1)Kanta Suzuki¹, Kenichi Kaminaga¹, Shingo Maruyama¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

2:15 PM - 2:30 PM

△ [13p-N203-4] Photocatalysis of compositionally-graded Mg-doped ZnO thin films

〇(M2)Yuta Sato¹, Shingo Maruyama¹, Kenichi Kaminaga¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

2:30 PM - 2:45 PM

△ [13p-N203-5] Combinatorial synthesis for n-type oxide semiconductor based channel materials for tunnel FETs

〇Yuki Daimon^1,2, Toyohiro Chikyow², Astushi Ogura^1,3, Takahiro Nagata^2,3 (1.Meiji Univ., 2.NIMS, 3.MREL)

2:45 PM - 3:00 PM

△ [13p-N203-6] Fabrication of TiO₂ Optical Thin Film with Low Refractive Index by Combination Deposition

〇Mai Hayamizu¹, Hiroshi Murotani², Shigeharu Matsumoto³ (1.Grad. Sch. of Sci. and Tech., Tokai Univ., 2.Tokai Univ., 3.SHINCRON CO., LTD.)

3:00 PM - 3:15 PM

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO₂ Optical Thin Films by Electron Beam and Sputtering Evaporation part2

〇(M1)Mutsuki Ito¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

3:15 PM - 3:30 PM

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

〇(M2)Taisei Wakamiya¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Graduate School of Eng. Tokai Univ., 2.SHINCRON CO.LTD.)

3:30 PM - 3:45 PM

△ [13p-N203-9] Multilayer with Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)

〇(D)Naoya Tajima¹, Shigeharu Matsumoto², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON CO. LTD.)

3:45 PM - 4:00 PM

▼ [13p-N203-10] Structural stability of 2D II-V compounds

〇(D)Lucia Arellano^1,2, Takayuki Suga¹, Miguel Cruz-Irisson², Jun Nakamura¹ (1.UEC Tokyo, 2.IPN Mexico)

Poster presentation

[22a-P04-1~18] 6.4 Thin films and New materials

Wed. Sep 22, 2021 9:00 AM - 10:40 AM P04 (Poster)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 10:40 AM

[22a-P04-1] PLD synthesis of NiO-based films on SrTiO₃ and effect of atmospheric O₂ annealing

〇(M1)Yuki Goto¹, Shohei Hisatomi¹, Tomoaki Oga¹, Kenta Kaneko¹, Satoru Kaneko^2,1, Mamoru Yoshimoto¹, Akifumi Matsuda¹ (1.TokyoTech, 2.KISTEC)

9:00 AM - 10:40 AM

[22a-P04-2] Electrical properties of TiN before and after annealing in air

〇Riku Shimizu¹, Daichi Oikawa¹, Toshiaki Fujita², Toshiki Makimoto¹ (1.Waseda Univ., 2.Mitsubishi Material Corporation)

9:00 AM - 10:40 AM

[22a-P04-3] Preparation and structural investigation of Mn₃Sn_0.5Zn_0.5N thin films with negative thermal expansion

〇Genki Takehara¹, Kanta Sadashima¹, Masaaki Tanaka¹, Ko Mibu¹ (1.Nagoya Inst. of Tech.)

9:00 AM - 10:40 AM

[22a-P04-4] Effect of nitrogen plasma fusion on excimer laser irradiation process

〇Kazuto Sodeyama¹, Mamami Nishikawa¹, Takayuki Ishibashi¹, Masami Kawahara², Tomohiko Nakajima³, Tetsuo Tsuchiya³ (1.Nagaoka Univ. of Tech., 2.Kojundo Chem. Lab., 3.AIST)

9:00 AM - 10:40 AM

[22a-P04-5] Development of ultrasonic atomization technique for MOD solutions for Bi-substituted rare-earth iron garnet thin films

〇Keitaro Isomura¹, Nishikawa Masami¹, Kawahara Masami², Arakawa Ryo³, Mori Shigeki³, Ishibashi Takayuki¹ (1.Nagaoka Univ. of Tech., 2.Kojundo Chem. Lab., 3.AIT)

9:00 AM - 10:40 AM

[22a-P04-6] Magneto-optical Characterization and Preparation of Bi-substituted RIG and RIGG Thin Films Using a Series of Rare Earth Elements on Glass Substrate

〇Takao Nishi¹, Kenta Mori¹, Takeshi Kato², Masami Nishikawa³, Takayuki Ishibashi³ (1.Kobe City Col. of Tech., 2.Nagoya Univ., 3.Nagaoka Univ. of Tech.)

9:00 AM - 10:40 AM

[22a-P04-7] Solid-phase crystallization of Ga₂O₃ thin films on polymers by excimer laser annealing

〇(M1)Ryoya Kai¹, Kazuki Watanabe¹, Tomoaki Oga¹, Satoru Kaneko^2,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.KISTEC)

9:00 AM - 10:40 AM

[22a-P04-8] Transparent Conducting Films of Fluorine-Doped Indium Oxide Nanocubes

〇Takumi Matsushita¹, Seung Hyuk Lee¹, Tetsu Tatsuma¹ (1.Institute of Industrial Science, The University of Tokyo)

9:00 AM - 10:40 AM

[22a-P04-9] Improvement of conductivity and flexibility of ITO nanofiber non-woven cloth

〇(M1C)Jun Okishita¹, Ken Yoshinaga¹, Teruaki Nomiyama¹, Yuji Horie¹ (1.Kagoshima Univ.)

9:00 AM - 10:40 AM

[22a-P04-10] Room-temperature atomic layer deposition of silica and aluminosilicate multiple layers and its application for ion sorption

〇Takeru Saito¹, Kentaro Saito^1,2, Masanori Miura³, Kensaku Kanomata³, Fumihiko Hirose¹ (1.Yamagata Univ., 2.JSPS Research Fellow, 3.ROEL Yamagata Univ.)

9:00 AM - 10:40 AM

[22a-P04-11] Attempt to THz Gas Sensing by Ceramics Architecture with Terahertz Time-domain Spectroscopy

〇Keiji Komatsu¹, Toshiyuki Iwamoto², Haruhiko Ito¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.NIPPO PRECISION Co.,Ltd.)

9:00 AM - 10:40 AM

[22a-P04-12] Oxygen Flow Rate Dependence of Crystalline Property of YSZ Thin Films Deposited at Room-temperature by Reactive Sputtering

〇(M2)Jingyao Zhou¹ (1.JAIST)

9:00 AM - 10:40 AM

▲ [22a-P04-13] Photoelectron spectroscopy measurements of β-tungsten thin film

〇HeunTae Lee¹, Hitoshi Yamaoka², Hitoshi Sato³, Masashi Arita³ (1.Osaka Univ., 2.RIKEN/SPring-8, 3.Hiroshima Synchrotron Radiation Center)

9:00 AM - 10:40 AM

[22a-P04-14] Fabrication of Conductive Silver-Microplate Thin Film by a Filtration-Transfer Method

〇Takumi Furusawa¹, Manabu Ishizaki¹, Masato Kurihara¹ (1.Yamagata Univ.)

9:00 AM - 10:40 AM

[22a-P04-15] Characterization of two-dimensional oxide nanosheets exfoliated from Ga-based liquid metal alloys

〇Naoki Maeda¹, Takahiko Ban², Meguru Nagai¹, Yamamoto Shinichi¹, Imai Takahito¹, Miyato Yuji¹ (1.Ryukoku Univ., 2.Univ. of Shiga Pref.)

9:00 AM - 10:40 AM

[22a-P04-16] Fabrication of compositionally-graded Ce doped LiCoO2 epitaxial thin films

〇(M1)Kanta Suzuki¹, Kenichi Kaminaga¹, Shingo Maruyama¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

9:00 AM - 10:40 AM

[22a-P04-17] New orientation control of ZnO thin films via the carbonate hydroxide with NaCl flux

〇(M1)Koki Kuroda¹, Kenichi Kaminaga¹, Shingo Maruyama¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

9:00 AM - 10:40 AM

[22a-P04-18] Phase Change Phenomenon of Ge2Sb2Te5 Thin Layer Induced by Electric Discharge

〇(B)So Morita¹, Joe Sakai², Masashi Kuwahara³, Satoshi Katano¹ (1.Riec, Tohoku Univ., 2.Toshima Manufacturing Co., Ltd., 3.AIST)

Sessions

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[12a-N203-1~10] 6.4 Thin films and New materials

[12p-N203-1~12] 6.4 Thin films and New materials

[13a-N203-1~7] 6.4 Thin films and New materials

▼ [13a-N203-2] Selective fabrication of Ca2NH and CaNH epitaxial thin films using reactive magnetron sputtering

△ [13a-N203-3] Epitaxial thin-film growth and optical property characterization of a layered compound BiI3

△ [13a-N203-4] Low-Temperature Growth of Non-Degenerate Wurtzite-Type MgxZn1-xSnN2Alloy Films

△ [13a-N203-5] Conduction-Band Effective Mass in Wurtzite-Type MgSnN2

▼ [13a-N203-6] A study of Ar/N2-sputtering gas pressure on electrical characteristics of LaBxNy insulator formed by RF sputtering

△ [13a-N203-7] Epitaxial growth of IMO thin film on YSZ(111) by mist CVD method

[13p-N203-1~10] 6.4 Thin films and New materials

△ [13p-N203-2] PLD synthesis and characterization of aliovalent-doped layered La-Ni-O system epitaxial films

△ [13p-N203-3] Preliminary synthesis of LiNi0.67Mn0.33O2 epitaxial thin filmsfor designing compositionally graded thin film LiNixMnyCozO2

△ [13p-N203-4] Photocatalysis of compositionally-graded Mg-doped ZnO thin films

△ [13p-N203-5] Combinatorial synthesis for n-type oxide semiconductor based channel materials for tunnel FETs

△ [13p-N203-6] Fabrication of TiO2 Optical Thin Film with Low Refractive Index by Combination Deposition

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO2 Optical Thin Films by Electron Beam and Sputtering Evaporation part2

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

△ [13p-N203-9] Multilayer with Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)

▼ [13p-N203-10] Structural stability of 2D II-V compounds

[22a-P04-1~18] 6.4 Thin films and New materials

▲ [22a-P04-13] Photoelectron spectroscopy measurements of β-tungsten thin film

Authenticate

▼ [13a-N203-2] Selective fabrication of Ca₂NH and CaNH epitaxial thin films using reactive magnetron sputtering

△ [13a-N203-3] Epitaxial thin-film growth and optical property characterization of a layered compound BiI₃

△ [13a-N203-4] Low-Temperature Growth of Non-Degenerate Wurtzite-Type Mg_xZn_1-xSnN₂Alloy Films

△ [13a-N203-5] Conduction-Band Effective Mass in Wurtzite-Type MgSnN₂

▼ [13a-N203-6] A study of Ar/N₂-sputtering gas pressure on electrical characteristics of LaB_xN_y insulator formed by RF sputtering

△ [13p-N203-3] Preliminary synthesis of LiNi_0.67Mn_0.33O₂ epitaxial thin films
for designing compositionally graded thin film LiNi_xMn_yCo_zO₂

△ [13p-N203-6] Fabrication of TiO₂ Optical Thin Film with Low Refractive Index by Combination Deposition

△ [13p-N203-7] Hydrophilicity evaluation of low refractive index SiO₂ Optical Thin Films by Electron Beam and Sputtering Evaporation part2

△ [13p-N203-8] Light Scattering of Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation Part 4

△ [13p-N203-9] Multilayer with Low Refractive Index SiO₂ Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (2)