[L-3-1] Applications of Nanotechnology in Biomedical Micro/Nano Devices

G. J. Wang¹ (1.National Chung Hsing Univ. , Taiwan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[L-3-2] Development of Nanoscale Patterning Method of Self-Assembled Monolayer using Photothermal Desorption in Near-field

Y. Yamamoto¹、Y. Taguchi¹、Y. Nagasaka¹ (1.Keio Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[L-3-3] Positional control of crystal grains in silicon thin film utilizing cage shaped protein

Y. Tojo¹、A. Miura^1,2、I. Yamashita^1,3,4、Y. Uraoka^1,4 (1.NAIST , Japan、2.National Chiao Tung Univ. , Taiwan、3.Panasonic Corp.、4.CREST , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[L-3-4] Control of Activation Energy for Electron Transport in Two-Dimensional Array of Si Nanodisks

M. Igarashi¹、C. H. Huang¹、T. Morie²、S. Samukawa¹ (1.Tohoku Univ.、2.Kyushu Inst. of Tech. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[L-3-5] Optical Characteristics of Two-dimensional Array of Si Nano-disks Fabricated by Defect-free Neutral Beam Etching with Bio-template

C. H. Huang^1,4、M. Igarashi^1,4、M. F. Budiman¹、R. Oshima^2,4、I. Yamashita^3,4、Y. Okada^2,4、S. Samukawa^1,4 (1.Tohoku Univ.、2.Univ. of Tokyo、3.NAIST、4.CREST , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P-1-1] Strained Si with Smooth and Uniformly Strained Surface Formed by Sputter Epitaxy

H. Hanafusa¹、N. Hirose²、A. Kasamatsu²、T. Mimura²、T. Matsui²、H. M. H. Chong³、H. Mizuta³、Y. Suda¹ (1.Tokyo Univ. of Agri. And Tech.、2.National Inst. of Info. and Commun. Tech. , Japan、3.Univ. of Southampton , UK)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P-1-2] Enhancement of Stress Memorization Technique (SMT) by High Thermal Annealing Temperature

H. Y. Chang¹、J. C. S. Woo¹ (1.University of California, Los Angeles , USA)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P-1-3] Evaluation of Si/SiO₂ Interface Properties for CMOS Fabricated on Hybrid Orientation Substrate with Amorphization/Templated Recrystallization Method

P. C. Huang¹、S. L. Wu²、S. J. Chang¹、J. F. Chen¹、Y. T. Huang¹、D. G. Hong²、C. Y. Chang¹、C. Y. Wu²、C. T. Lin³、M. Ma³、O. Cheng³ (1.National Cheng Kung Univ.、2.Cheng Shiu Univ.、3.UMC , Taiwan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P-1-4] Efficient Activation of As in Ultrashallow Junction Induced by Thermal Plasma Jet Microsecond Annealing

K. Matsumoto¹、S. Higashi¹、H. Murakami¹、S. Miyazaki¹ (1.Hiroshima Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

[P-1-5] Depth Profile and Retained Dose in SiO₂/Si Structure for B₁₈H_X⁺ Implantation

Y. Kawasaki^1,2、H. Yoshimura¹、K. Asai¹、K. Shibahara² (1.Renesas Electronics Corp.、2.Hiroshima Univ. , Japan)

2010 International Conference on Solid State Devices and Materials |PDF ダウンロード

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